ISSN: 0914-9244

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Journal of Photopolymer Science and Technology Q3 Unclaimed

Tokai University Japan

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Journal of Photopolymer Science and Technology is a journal indexed in SJR in Organic Chemistry and Materials Chemistry with an H index of 42. It has an SJR impact factor of 0,264 and it has a best quartile of Q3. It is published in English. It has an SJR impact factor of 0,264.

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Materials Chemistry (Q3) Polymers and Plastics (Q3) Organic Chemistry (Q4)

Price

- €

Inmediate OA

NPD

Embargoed OA

- €

Non OA

Metrics

Journal of Photopolymer Science and Technology

0,264

SJR Impact factor

42

H Index

88

Total Docs (Last Year)

223

Total Docs (3 years)

2153

Total Refs

177

Total Cites (3 years)

223

Citable Docs (3 years)

0.84

Cites/Doc (2 years)

24.47

Ref/Doc

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Aims and Scope

Best articles by citations

Characterization of Nanoimprint Resin and Antisticking Layer by Scanning Probe Microscopy

Mass Transfer during Anionic UV-curing of Epoxy Resins

Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.

Plasma Polymer Thin Films with Controlled Topography and Chemistry at the Nanoscale

Optical Monitoring of a Poly(styrene) Residual Layer on a Photocrosslinkable Monolayer in Thermal Nanoimprint Lithography

EUV Resists: Pushing to the Extreme

Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography

Liquid Crystal Alignment on Rubbed Polyvinyl-Cinnamate with Overdose of UV Light

Preparation of Porphyrin Derivatives-Protected Gold Nanoparticles

Fluorescence Studies on Self-association of Biodegradable Pyrene-labeled Poly(L-lysine) Grafted with Poly(caprolactone)

Substituent Effect of Photo and Thermal Decomposition Rate of Diazocompounds with Inclusion Compounds

Influence of Viscosity on Photopolymerization in Film as Studied by Real Time FTIR

SHOW MORE ARTICLES

Highly Sensitive ^|^alpha;-Acyloxymethacrylate Cross-linking Agents with High Curability in the Presence of Atmospheric Oxygen

Frequency Dispersion of Permittivity of SU-8 Resist Thin Film

Tactile Senses Control by Contacting a Human Finger with Micro Resist Pattern Arrangements

Grating Formation by Periodic Photopolymerization in Organic Photovoltaic Devices

Micropatterning for Vinylsilsesquioxane-Titania Hybrid Gel Films with Ultraviolet Light Irradiation

Excitation Emission Matrix of Spin-coated Polymeric Thin Films and its Application to Polarized Fluorescence

Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate

Metal Oxide Nanoparticle Photoresists for EUV Patterning

Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process

Electroluminescent Properties of a Solution Processable Carbazole-Substituted Iridium(III) Complex

Photocuring by Infrared Irradiation Using Upconversion Emission

Radiation Induced One-Step One-pod Polymerization of Functional Conjugated Molecules