ISSN: 0914-9244

Journal Home

Journal Guideline

Journal of Photopolymer Science and Technology Q4 Unclaimed

Tokai University Japan

Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Journal of Photopolymer Science and Technology is a journal indexed in SJR in Organic Chemistry and Materials Chemistry with an H index of 41. It has an SJR impact factor of 0,181 and it has a best quartile of Q4. It is published in English. It has an SJR impact factor of 0,181.

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Materials Chemistry (Q4) Organic Chemistry (Q4) Polymers and Plastics (Q4)

Price

- €

Inmediate OA

NPD

Embargoed OA

- €

Non OA

Metrics

Journal of Photopolymer Science and Technology

0,181

SJR Impact factor

41

H Index

0

Total Docs (Last Year)

260

Total Docs (3 years)

0

Total Refs

151

Total Cites (3 years)

259

Citable Docs (3 years)

0.45

Cites/Doc (2 years)

0.0

Ref/Doc

Comments

No comments ... Be the first to comment!

Publication speed *

Review quality *

Edition and editorial team *

Institutional email or ORCID *

* The email or ORCID field is only to validate the authenticity of the comment, the identity will not be public. .

Other journals with similar parameters

Chemistry of Heterocyclic Compounds Q4
Phosphorus, Sulfur and Silicon and the Related Elements Q4
Current Protocols in Nucleic Acid Chemistry Q4
Organic Preparations and Procedures International Q4
Russian Journal of Bioorganic Chemistry Q4

Compare this journals

Aims and Scope

Best articles by citations

Characterization of Nanoimprint Resin and Antisticking Layer by Scanning Probe Microscopy

Mass Transfer during Anionic UV-curing of Epoxy Resins

Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.

Plasma Polymer Thin Films with Controlled Topography and Chemistry at the Nanoscale

Optical Monitoring of a Poly(styrene) Residual Layer on a Photocrosslinkable Monolayer in Thermal Nanoimprint Lithography

EUV Resists: Pushing to the Extreme

Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography

Liquid Crystal Alignment on Rubbed Polyvinyl-Cinnamate with Overdose of UV Light

Preparation of Porphyrin Derivatives-Protected Gold Nanoparticles

Fluorescence Studies on Self-association of Biodegradable Pyrene-labeled Poly(L-lysine) Grafted with Poly(caprolactone)

Substituent Effect of Photo and Thermal Decomposition Rate of Diazocompounds with Inclusion Compounds

Influence of Viscosity on Photopolymerization in Film as Studied by Real Time FTIR

SHOW MORE ARTICLES

Highly Sensitive ^|^alpha;-Acyloxymethacrylate Cross-linking Agents with High Curability in the Presence of Atmospheric Oxygen

Frequency Dispersion of Permittivity of SU-8 Resist Thin Film

Tactile Senses Control by Contacting a Human Finger with Micro Resist Pattern Arrangements

Grating Formation by Periodic Photopolymerization in Organic Photovoltaic Devices

Micropatterning for Vinylsilsesquioxane-Titania Hybrid Gel Films with Ultraviolet Light Irradiation

Excitation Emission Matrix of Spin-coated Polymeric Thin Films and its Application to Polarized Fluorescence

Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate

Metal Oxide Nanoparticle Photoresists for EUV Patterning

Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process

Electroluminescent Properties of a Solution Processable Carbazole-Substituted Iridium(III) Complex

Photocuring by Infrared Irradiation Using Upconversion Emission

Radiation Induced One-Step One-pod Polymerization of Functional Conjugated Molecules