Default: Applied Physics A

ISSN: 0947-8396

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Applied Physics A Q2 Unclaimed

Springer Heidelberg Germany
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Applied Physics A is a journal indexed in SJR in Materials Science (miscellaneous) and Chemistry (miscellaneous) with an H index of 154. It has a price of 2690 €. It has an SJR impact factor of 0.444 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0.444.

Applied Physics A focuses its scope in these topics and keywords: laser, carbon, si, electrical, egyptian, encapsulates, energy, eu, evaporation, fabrication, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy: Open Choice

Type of publications:

Publication frecuency: -

Price

2690 €

Inmediate OA

NPD

Embargoed OA

0 €

Non OA

Metrics

Applied Physics A

0.444

SJR Impact factor

154

H Index

952

Total Docs (Last Year)

2673

Total Docs (3 years)

42093

Total Refs

7075

Total Cites (3 years)

2673

Citable Docs (3 years)

2.82

Cites/Doc (2 years)

44.22

Ref/Doc

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Aims and Scope


laser, carbon, si, electrical, egyptian, encapsulates, energy, eu, evaporation, fabrication, femtosecond, films, filmselectrochemical, formation, formed, fulgidedoped, glass, macroporousntype, growth, halidefree, cuznsns, alane, ambient, ancient, backside, catalystslarge, ce, cell, characteristics, continuouswave, adductsnew, cvd, cwlbinanoscale, decorated, deposition, desulfurization, devices, devicesnovel,



Best articles by citations

Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

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Uniaxial stress dependence of ferroelectric properties of xPMN-(1-x)PZT ceramic systems

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Thermal stability and electrical properties of Zr silicate films for high-k gate-dielectric applications, as prepared by pulsed laser deposition

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Pulsed-laser deposition of a Nd:KGd(WO4)2 waveguide in Ar and O2 environments

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Structural and electrical properties of Zr oxide film for high-k gate dielectrics by using electron cyclotron resonance plasma sputtering

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Tuning vertically stacked InAs/GaAs quantum dot properties under spacer thickness effects for 1.3 µm emission

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Fluorescence studies of polycrystalline Al2O3 composite constituents: piezo-spectroscopic calibration and applications

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Preparation of epitaxial compositionally graded (Ba1-xSrx)TiO3 thin films with enhanced dielectric properties

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Novel forming of single and multiple ceramic micro-channels

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gamma-Fe2O3 nanoparticles prepared by laser ablation of a tiny wire

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The influence of disorder on magnetocaloric effect and the order of transition in ferromagnetic manganite (La1-x Nd x )2/3(Ca1-y Sr y )1/3MnO3

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Fabrication of molecular-electronic circuits by nanoimprint lithography at low temperatures and pressures

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Low-n mesoporous silica films: structure and properties

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Formation of thermally stable low-resistance Ti/W/Au ohmic contacts on n-type GaN

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Electroless gold deposition on silicon(100)wafer based on a seed layer of silver

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Emission characteristics of inorganic/organic hybrid white-light phosphor

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Formation of an intermediate phase in the ball milling synthesis of the sillenite phase of BSO and BTO

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Electrical characteristics of Ta2O5 based capacitors with different gate electrodes

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Analysis of the interface between a pulsed laser deposited calcium phosphate coating and a titanium alloy substrate

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Laser direct write of planar alkaline microbatteries

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Giant field amplification in tungsten nanowires

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The effective conductivity of composite materials with cubic arrays of multi-coated spheres

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Interface formation of iron on In-terminated InAs(001)

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Lines of periodic hole structures produced by laser ablation using interfering femtosecond lasers split by a transmission grating

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