verified SJR 0,395 · Q2 • database Scopus / SJR & Web of Science indexed

United States · Institute of Electrical and...

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IEEE Transactions on Plasma Science

IEEE Transactions on Plasma Science is a journal indexed in SJR in Condensed Matter Physics and Nuclear and High Energy Physics with an H index of 124. It has an SJR impact factor of 0,395 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,395.

IEEE Transactions on Plasma Science focuses its scope in these topics and keywords: plasma, discharge, columns, launcher, current, density, application, electromagnetic, glowdischarge, amplification, ...

ISSN: 0093-3813

Editorial: Institute of Electrical and Electronics Engineers Inc.

Category: Condensed Matter Physics

Indexation: verifiedScopus / SJR verifiedWeb of Science

Unclaimed profile — some fields may be incomplete.

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SJR Impact Factor trending_up

0,395 Q2

H-index 124

Tasa de Aceptación pie_chart

24% Selectiva

Fuente Acceptance_Rate

Tiempo a publicación hourglass_top

NPD

Campo Sin dato

Coste de Publicación (APC) payments

NPD Subscription

Ruta Non-OA NPD

Metrics

Campos Scimago / CoP — sin series inventadas

Scopus / SJR Web of Science

SJR Impact

0,395

H-index

124

Docs (year)

693

Docs 3y

1563

Total refs

19628

Cites 3y

2802

Citable 3y

1545

Cites/Doc 2y

1.76

Ref/Doc

28.32

Immediate OA

—

Embargoed OA

NPD

Non OA / Submission

—

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Best articles by citations

Characterization of inductively coupled plasma using neural networks

Very slowly decaying afterglow plasma in cryogenic helium gas

Design and Testing of a Two-Turn Electromagnetic Launcher

Current-zero measurements of vacuum circuit breakers interrupting short-line faults

Current zero behavior of vacuum interrupters with bipolar and quadrupolar AMF contacts

Current collection and discharges on high voltage solar array for space use in plasma

Critical analysis of matching schemes in capacitively coupled discharges

Correlation of Characteristic Ne SXR Signal Pulse With Computed Plasma Focus Dynamics in the Ne (97.5%)-Kr (2.5%) Admixtures of the INTI PF Machine at 12 kV

Control of stress and microstructure in cathodic arc deposited films

Control of implantation area in direct-current plasma immersion ion implantation (DC-PIII)

Comparison of excessive balmer a line broadening of inductively and capacitively coupled RF, microwave, and glow-discharge hydrogen plasmas with certain catalysts

Coaxial-Waveguide Gyrotron Amplifier Operating With High Power and Ultrahigh Gain in Millimeter and Submillimeter Waves

SHOW MORE ARTICLES

Circuit model for two-electrode AC discharge

"Corrections to ""Advancements in codes for computer aided design of depressed collectors and tracing of backscattered electrons-part II. Improvements in modelling of the physics of secondary electron emission and backscattering"

Characteristics of charged and metastable species in micro-discharges of AC- plasma display panel

Characteristics of a Gliding Arc Discharge Under the Influence of a Laminar Premixed Flame

Analysis of collisional sheath structure in an argon DC discharge

Analysis of a metallic reflector grating with the influence of the joule loss taken into account

An analysis of the instability phenomena of a low-current vacuum arc for copper cathodes

Absolute Calibration of a Prompt Gamma-Ray Detector for Intense Bursts of Protons

A two-dimensional nonstationary model of the initiation of an explosive center beneath the plasma of a vacuum arc cathode spot

A simplified model of the formation of a deep potential well in a vacuum diode

A New Approach for Modeling Electromagnetic Railguns

A Convenient Method to Realize Large-Area APGD for Wool Surface Modification

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