ISSN: 0963-0252

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Plasma Sources Science and Technology Q1 Unclaimed

IOP Publishing Ltd. United Kingdom

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Plasma Sources Science and Technology is a journal indexed in SJR in Condensed Matter Physics with an H index of 123. It has an SJR impact factor of 0,771 and it has a best quartile of Q1. It is published in English. It has an SJR impact factor of 0,771.

Plasma Sources Science and Technology focuses its scope in these topics and keywords: atoms, electron, diagnostics, pressure, ions, low, neutrals, monitoring, molecules, molecular, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Condensed Matter Physics (Q1)

Price

- €

Inmediate OA

NPD

Embargoed OA

- €

Non OA

Metrics

0,771

SJR Impact factor

123

H Index

242

Total Docs (Last Year)

883

Total Docs (3 years)

14108

Total Refs

3231

Total Cites (3 years)

882

Citable Docs (3 years)

3.26

Cites/Doc (2 years)

58.3

Ref/Doc

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Annual Review of Condensed Matter Physics Q1
Materials Science and Engineering: R: Reports Q1
Annual Review of Fluid Mechanics Q1
Materials Today Q1
Advanced Functional Materials Q1

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Aims and Scope

Best articles by citations

Investigation of microwave plasmas produced in a mirror machine using ordinary-mode polarization

Comprehensive modelling network for dc glow discharges in argon

Characterization of a hollow cathode styled plasma reactor for photovoltaic applications

The effect of a microwave induced plasma on an obstructed glow discharge

Study of an ECR sputtering plasma source

Overview of growth and behaviour of clusters and particles in plasmas

PLASIMO, a general model: I. Applied to an argon cascaded arc plasma

Space-averaged kinetic analysis of stochastically heated electropositive and electronegative rf capacitive discharges

RF frequency effects on molecular fragmentation

Simple analysis of a capacitive discharge with a bi-Maxwellian electron distribution

Langmuir probe studies of a helicon plasma system

Electrical characteristics and electron heating mechanism of an inductively coupled argon discharge

SHOW MORE ARTICLES

Stable modes and abrupt density jumps in a helicon plasma source

NO removal in a photo-triggered discharge reactor

Effects of reactor pressure on two-dimensional radio-frequency methane plasma: a numerical study

Diode laser absorption measurements of metastable helium in glow discharges

Hollow needle-to-plate electrical discharge at atmospheric pressure

Self-consistent kinetic model of low-pressure - flowing discharges: I. Volume processes

A comparative study of the electron distribution function in the positive columns in and /He dc glow discharges by optical spectroscopy and probes

Real-time determination of plasma etch-rate selectivity

Helicon waves in a non-uniform plasma

A Monte Carlo simulation of ion transport at finite temperatures

Surface temperature and thermal balance of probes immersed in high density plasma

Effects of phase regulation on ion energy distribution in RF bias sputtering