verified SJR 0,588 · Q2 • database Scopus / SJR & Web of Science indexed

United Kingdom · IOP Publishing Ltd.

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Plasma Sources Science and Technology

Plasma Sources Science and Technology is a journal indexed in SJR in Condensed Matter Physics with an H index of 128. It has an SJR impact factor of 0,588 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,588.

Plasma Sources Science and Technology focuses its scope in these topics and keywords: diagnostics, atoms, pressure, electron, ions, low, monitoring, organic, distribution, coupled, ...

ISSN: 0963-0252

Publisher: IOP Publishing Ltd.

Category: Condensed Matter Physics

Indexation: verifiedScopus / SJR verifiedWeb of Science

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schedule CountryOfPapers database fields

SJR Impact Factor trending_up

0,588 Q2

H-index 128

Acceptance rate pie_chart

24% Selective

Source Acceptance_Rate

Time to publication hourglass_top

NPD

Field NPD

Publication cost (APC) payments

NPD Subscription

Non-OA path NPD

Metrics

Scimago and CountryOfPapers database fields

Scopus / SJR Web of Science

SJR Impact

0,588

H-index

128

Docs (year)

214

Docs 3y

814

Total refs

11042

Cites 3y

2641

Citable 3y

814

Cites/Doc 2y

3.28

Ref/Doc

51.6

Immediate OA

—

Embargoed OA

NPD

Non OA / Submission

—

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Best articles by citations

Applications of the cavity ring-down technique to a large-area rf-plasma reactor

Zinc ionization by interaction with argon plasma

Development of a new type of Cs plasma ion gun for application in a heavy ion beam tokamak diagnostic

Designing advanced filters for macroparticle removal from cathodic arc plasmas

Density limit in helicon discharges

Comprehensive modelling network for dc glow discharges in argon

Comparison of Pyrex plate and spectroscopic temperature measurements for gas temperature monitoring in a nitrogen afterglow

Comparative study of silane radical composition in continuous and pulsed electron cyclotron resonance discharges

Comparative study of low energy Mather-type plasma focus devices

Characterization of the E to H transition in a pulsed inductively coupled plasma discharge with internal coil geometry: bi-stability and hysteresis

Characterization of a hollow cathode styled plasma reactor for photovoltaic applications

Calculation of discharge parameters in low-pressure diode-type radio frequency noble gas plasmas

SHOW MORE ARTICLES

Asymmetric plasma potential fluctuation in an inductive plasma source

A comparative study of the electron distribution function in the positive columns in and /He dc glow discharges by optical spectroscopy and probes

Analytical estimations on the axial structure of plasma-waveguide discharges

Analysis of the arc-cathode interaction of free-burning arcs

Analysis and numerical modelling of silicon nitride deposition in a plasma-enhanced chemical vapour deposition reactor. II. Simplified modelling, systematic analysis and comparison with experimental measurements

An experimental study of stationary population inversion in a cold recombining expanding helium plasma jet

A two-dimensional, axisymmetric model of a magnetized glow discharge plasma

A Thomson scattering diagnostic system for measurement of electron properties of processing plasmas

A new type of seeded continuous plasma centrifuge

A new ion pitch-angle diagnostic for magnetized plasmas

A multi-term solution of the nonconservative Boltzmann equation for the analysis of temporal and spatial non-local effects in charged-particle swarms in electric and magnetic fields

A Monte Carlo simulation of ion transport at finite temperatures

FAQs

Plasma Sources Science and Technology has an SJR of 0,588 (best quartile Q2) in the CountryOfPapers database.

Immediate OA APC is not available (NPD).

The acceptance rate recorded for Plasma Sources Science and Technology is 24%.

Plasma Sources Science and Technology

Metrics

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Researcher reviews

Best articles by citations

FAQs

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