Default: Plasma Sources Science and Technology

ISSN: 0963-0252

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Plasma Sources Science and Technology Q1 Unclaimed

IOP Publishing Ltd. United Kingdom
Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Plasma Sources Science and Technology is a journal indexed in SJR in Condensed Matter Physics with an H index of 108. It has an SJR impact factor of 0,9 and it has a best quartile of Q1. It is published in English. It has an SJR impact factor of 0,9.

Plasma Sources Science and Technology focuses its scope in these topics and keywords: atoms, electron, diagnostics, pressure, ions, low, neutrals, monitoring, molecules, molecular, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Price

- €

Inmediate OA

NPD

Embargoed OA

- €

Non OA

Metrics

Plasma Sources Science and Technology

0,9

SJR Impact factor

108

H Index

314

Total Docs (Last Year)

708

Total Docs (3 years)

16934

Total Refs

2866

Total Cites (3 years)

705

Citable Docs (3 years)

3,81

Cites/Doc (2 years)

53,93

Ref/Doc

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Aims and Scope


atoms, electron, diagnostics, pressure, ions, low, neutrals, monitoring, molecules, molecular, picmcc, plasmaelectronimpact, plasmasprotontransferreaction, plasmasvuv, postdischarge, power, pptv, probe, mixing, mass, magnetron, coupled, deviceeffects, dischargesoptical, distribution, dust, energydependent, fast, field, gas, horizontal, hydrogen, impact, ionization,



Best articles by citations

Investigation of microwave plasmas produced in a mirror machine using ordinary-mode polarization

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Comprehensive modelling network for dc glow discharges in argon

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Characterization of a hollow cathode styled plasma reactor for photovoltaic applications

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The effect of a microwave induced plasma on an obstructed glow discharge

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Study of an ECR sputtering plasma source

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Overview of growth and behaviour of clusters and particles in plasmas

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PLASIMO, a general model: I. Applied to an argon cascaded arc plasma

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Space-averaged kinetic analysis of stochastically heated electropositive and electronegative rf capacitive discharges

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RF frequency effects on molecular fragmentation

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Simple analysis of a capacitive discharge with a bi-Maxwellian electron distribution

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Langmuir probe studies of a helicon plasma system

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Electrical characteristics and electron heating mechanism of an inductively coupled argon discharge

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SHOW MORE ARTICLES

Stable modes and abrupt density jumps in a helicon plasma source

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NO removal in a photo-triggered discharge reactor

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Effects of reactor pressure on two-dimensional radio-frequency methane plasma: a numerical study

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Diode laser absorption measurements of metastable helium in glow discharges

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Hollow needle-to-plate electrical discharge at atmospheric pressure

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Self-consistent kinetic model of low-pressure - flowing discharges: I. Volume processes

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A comparative study of the electron distribution function in the positive columns in and /He dc glow discharges by optical spectroscopy and probes

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Real-time determination of plasma etch-rate selectivity

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Helicon waves in a non-uniform plasma

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A Monte Carlo simulation of ion transport at finite temperatures

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Surface temperature and thermal balance of probes immersed in high density plasma

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Effects of phase regulation on ion energy distribution in RF bias sputtering

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