ISSN: 0734-2101

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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films Q2 Unclaimed

AVS Science and Technology Society United States

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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is a journal indexed in SJR in Surfaces, Coatings and Films and Condensed Matter Physics with an H index of 119. It has a price of 1250 €. It has an SJR impact factor of 0,55 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,55.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films focuses its scope in these topics and keywords: etching, ion, plasma, deposition, films, sio, oxide, beam, atomic, silicon, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Condensed Matter Physics (Q2) Surfaces and Interfaces (Q2) Surfaces, Coatings and Films (Q2)

Price

1250 €

Inmediate OA

NPD

Embargoed OA

0 €

Non OA

Metrics

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

0,55

SJR Impact factor

119

H Index

265

Total Docs (Last Year)

791

Total Docs (3 years)

13766

Total Refs

2025

Total Cites (3 years)

786

Citable Docs (3 years)

2.66

Cites/Doc (2 years)

51.95

Ref/Doc

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Aims and Scope

Best articles by citations

Radical detection in a methane plasma

Growth and stress evolution of hafnium nitride films sputtered from a compound target

High temperature processing of TiO2 thin films for application in silicon solar cells

Performance of inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film deposition

Reactive physical vapor deposition of TixAlyN: Integrated plasma-surface modeling characterization

Epitaxial growth of high-k BaxSr1-xTiO3 thin films on SrTiO3 (001) substrates by atomic layer deposition

Zirconia-alumina nanolaminate for perforated pitting corrosion protection of stainless steel

Growth of chemical vapor deposition aluminum titanate films at different CO2/H2 and aluminum butoxide inputs

Thermal stability of Pr[sub 2]O[sub 3] films grown on Si(100) substrate

Preferred orientation and film structure of TaN films deposited by reactive magnetron sputtering

Epitaxial niobium dioxide thin films by reactive-biased target ion beam deposition

Experimental and computer simulation studies of the "baffled target" reactive sputtering process

SHOW MORE ARTICLES

Effect of temperature on the growth of ultrathin films ofp-sexiphenyl on KCl(001)

Trace moisture emissions from heated metal surfaces in hydrogen service

Microstructure and properties of ultrathin amorphous silicon nitride protective coating

Investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide thin films

Contrast differences between scanning ion and scanning electron microscope images

Characteristics and anticoagulation behavior of polyethylene terephthalate modified by C2H2 plasma immersion ion implantation-deposition

Effect of an applied voltage during annealing on the resistivity and transparency of the amorphous tin oxide films

Electron beam fluorescence temperature measurements of N2 in a semiconductor plasma reactor

Study of C4F8/CO and C4F8/Ar/CO plasmas for highly selective etching of organosilicate glass over Si3N4 and SiC

Effects of ion beam application on the deposition of low-resistivity titanium nitride films onto silicon

Survey on measurement of tangential momentum accommodation coefficient

Effect of ion beam energy on magnetic properties of CoCrPt and CoPt thin films