verified SJR 0,473 · Q2 • database Scopus / SJR & Web of Science indexed

United States · AVS Science and Technology S...

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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is a journal indexed in SJR in Surfaces, Coatings and Films and Condensed Matter Physics with an H index of 127. It has a price of 1250 €. It has an SJR impact factor of 0,473 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,473.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films focuses its scope in these topics and keywords: etching, ion, plasma, deposition, oxide, beam, films, sio, atomic, scanning, ...

ISSN: 0734-2101

Publisher: AVS Science and Technology Society

Category: Surfaces, Coatings and Films

Indexation: verifiedScopus / SJR verifiedWeb of Science

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schedule CountryOfPapers database fields

SJR Impact Factor trending_up

0,473 Q2

H-index 127

Acceptance rate pie_chart

23% Selective

Source Acceptance_Rate

Time to publication hourglass_top

NPD

Field NPD

Publication cost (APC) payments

1.250 € Subscription

Non-OA path 0 €

Metrics

Scimago and CountryOfPapers database fields

Scopus / SJR Web of Science

SJR Impact

0,473

H-index

127

Docs (year)

337

Docs 3y

878

Total refs

15101

Cites 3y

1913

Citable 3y

873

Cites/Doc 2y

1.96

Ref/Doc

44.81

Immediate OA

1250 €

Embargoed OA

NPD

Non OA / Submission

0 €

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Best articles by citations

Control of nitrogen depth profile in ultrathin oxynitride films formed by pulse-time-modulated nitrogen beams

ZnO film deposition on Al film and effects of deposition temperature on ZnO film growth characteristics

Effect of temperature on the growth of ultrathin films ofp-sexiphenyl on KCl(001)

Effect of ion beam energy on magnetic properties of CoCrPt and CoPt thin films

Effect of deposition parameters on properties of ITO films prepared by reactive middle frequency pulsed dual magnetron sputtering

Effect of concurrent N2+ and N+ ion bombardment on the plasma-assisted deposition of carbon nitride thin film

Effect of an applied voltage during annealing on the resistivity and transparency of the amorphous tin oxide films

Easy method enhancing the sensitivity of a helium mass-spectrometer leak detector

Determination of titanium temperature and density in a magnetron vapor sputtering device assisted by two microwave coaxial excitation systems

Crystallographic structure and composition of vanadium nitride films deposited by direct sputtering of a compound target

Creation of stable, low work function surfaces on Si by implantation of 3 keV Cs[sup +]

Correlation between density and oxidation temperature for pyrolytic-gas passivated ultrathin silicon oxide films

SHOW MORE ARTICLES

Control of pressure rise in a vacuum chamber by boron nitride and copper composite coating

Ablation of piezoelectric polyvinylidene fluoride with a 193 nm excimer laser

Contrast differences between scanning ion and scanning electron microscope images

Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Comparison of pulsed and downstream deposition of fluorocarbon materials from C3F8 and c-C4F8 plasmas

Chemical states and band offsets of NH3-treated Si oxynitride films studied by high-resolution photoelectron spectroscopy

Chemical bonds of fluorocarbon films which can be a source of CFx radicals

Characterization of B-C-N hybrid prepared by ion implantation

Characteristics and anticoagulation behavior of polyethylene terephthalate modified by C2H2 plasma immersion ion implantation-deposition

Atomic transport and stability during annealing of HfO2 and HfAlO with an ultrathin layer of SiO2 on Si(001)

Antimony segregation in the oxidation of AlAsSb interlayers

Annealing of Hg1-xCdxTe: Hg loss rates and annealing of ion implantation damage

FAQs

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films has an SJR of 0,473 (best quartile Q2) in the CountryOfPapers database.

Immediate OA APC is 1250 EUR. Non-OA / submission fee is 0 EUR.

The acceptance rate recorded for Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films is 23%.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Metrics

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Researcher reviews

Best articles by citations

FAQs

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