ISSN: 0042-207X
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Vacuum Q1 Unclaimed
Vacuum is a journal indexed in SJR in Surfaces, Coatings and Films and Condensed Matter Physics with an H index of 108. It has a price of 1980 €. It has an SJR impact factor of 0,783 and it has a best quartile of Q1. It is published in English. It has an SJR impact factor of 0,783.
Vacuum focuses its scope in these topics and keywords: steel, hard, ion, behaviour, biased, claserinduced, coating, coatings, concentration, concentrations, ...
Type: Journal
Type of Copyright:
Languages: English
Open Access Policy: Open Choice
Type of publications:
Publication frecuency: -
1980 €
Inmediate OANPD
Embargoed OA0 €
Non OAMetrics
0,783
SJR Impact factor108
H Index950
Total Docs (Last Year)2474
Total Docs (3 years)42223
Total Refs10384
Total Cites (3 years)2467
Citable Docs (3 years)4.22
Cites/Doc (2 years)44.45
Ref/DocOther journals with similar parameters
Nano-Micro Letters Q1
Surface Science Reports Q1
Nature Reviews Materials Q1
Journal of Materiomics Q1
Progress in Surface Science Q1
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Aims and Scope
Best articles by citations
Dependence of metal sheet resistance on metal etch/post-etch treatment and subsequent process conditions
View moreThe charged dust in processing plasma sheath
View moreConductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets
View moreContinuous-wave laser thruster experiment
View moreBayard-Alpert gauge with additional ion collector for pressure measurements from 10-9-101 mbar
View moreInvestigation of the properties of a condensed rare gas film on a cold metal surface by means of small-angle ion scattering spectroscopy methods
View moreTreatment of NOx in exhaust gas by corona plasma over water surface
View moreEffect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates
View moreEpitaxial growth of CdSeTe films by remote plasma enhanced metal organic chemical vapor deposition
View moreDeposition of 3C-SiC films using ECR plasma of methylsilane
View morePrecise determination of the refractive index of sputtered MgO thin films in the visible light range
View moreInternal-antenna-driven inductive RF discharges for development of large-area high-density plasma sources with suppressed electrostatic coupling
View moreStudy on smoothing of titanium surface by intense pulsed ion beam irradiation
View moreProperties of high-density (Pb, La) (Zr, Ti) O3 ceramics for sputtering targets
View moreEpitaxial growth properties of Si and SiGe films prepared by ion beam sputtering process
View moreDC electric-field effect in bulk and thin-film Ge5As38Te57 chalcogenide glass
View moreThe formation of Ti-silicides by a metal vapour vacuum arc ion source implantation and annealing process
View moreAn ultrahigh vacuum chemical vapor deposition system and its application to growth of nMOSFET and HBT structures
View moreApplication of atomic absorption spectrometry to laser plume analysis
View moreHydrogen content and outgassing of air-baked and vacuum-fired stainless steel
View moreThe influence of the incidence energy of deposited particles on the growth morphology of thin films
View moreLarge-area production of solar absorbent multilayers by MF-pulsed plasma technology
View moreEpitaxial thin films of magnetic perovskites - preparation, properties and possible applications
View moreResidual Gas Analysis on the Daresbury Synchrotron Light Source
View more
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