Vacuum
Vacuum is a journal indexed in SJR in Surfaces, Coatings and Films and Condensed Matter Physics with an H index of 108. It has a price of 1980 €. It has an SJR impact factor of 0,783 and it has a best quartile of Q1. It is published in English. It has an SJR impact factor of 0,783.
Vacuum focuses its scope in these topics and keywords: steel, hard, ion, optical, corrosion, chromium, discharges, platingelectron, examinationthe, concentrations, ...
Metrics
Scimago and CountryOfPapers database fields
SJR Impact
0,783
H-index
108
Docs (year)
950
Docs 3y
2474
Total refs
42223
Cites 3y
10384
Citable 3y
2467
Cites/Doc 2y
4.22
Ref/Doc
44.45
Immediate OA
1980 €
Embargoed OA
NPD
Non OA / Submission
0 €
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Best articles by citations
Auger electron spectroscopy study of SiC thin films deposited on silicon
View moreYttria-stabilized zirconia (YSZ) heteroepitaxially grown on Si substrates by reactive sputtering
View moreDeposition of 3C-SiC films using ECR plasma of methylsilane
View moreDependence of metal sheet resistance on metal etch/post-etch treatment and subsequent process conditions
View moreDC electric-field effect in bulk and thin-film Ge5As38Te57 chalcogenide glass
View moreCxFy polymer film deposition in DC and RF fluorinert vapor plasmas
View moreCuInSe2 thin films obtained by a novel electrodeposition and sputtering combined method
View moreContinuous-wave laser thruster experiment
View moreConductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets
View moreComputer analysis of photon-induced non-equilibrium phenomena at Si and AlGaAs surfaces
View moreCalculation of electronic temperature dynamics in a collision cascade in a solid
View moreBoron nitride thin films synthesized by reactive sputtering
View moreBayard-Alpert gauge with additional ion collector for pressure measurements from 10-9-101 mbar
View more1-40kW steam respectively multi gas thermal plasma torch system
View moreAuger electron spectroscopy (AES) and electron energy loss spectroscopy (EELS) studies of GaP and Si surfaces
View moreApplication of strongly ionized AC tokamak plasma for synthesis of TiN thin films
View moreApplication of atomic absorption spectrometry to laser plume analysis
View moreAnode surface temperature profile in MPD thrusters
View moreAn ultrahigh vacuum chemical vapor deposition system and its application to growth of nMOSFET and HBT structures
View moreAluminum nitride thin films prepared by radical-assisted pulsed laser deposition
View moreAdsorption/desorption on PtIr alloy used for mass standards
View moreActive electronic devices fabricated by DC plasma arc spray process
View moreAchieving ultra high vacua: pumps and pumping systems
View moreA review of analysis methods for sub-micron indentation testing
View more