Default: Vacuum

ISSN: 0042-207X

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Vacuum Q1 Unclaimed

Elsevier Ltd United Kingdom
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Vacuum is a journal indexed in SJR in Surfaces, Coatings and Films and Condensed Matter Physics with an H index of 108. It has a price of 1980 €. It has an SJR impact factor of 0,783 and it has a best quartile of Q1. It is published in English. It has an SJR impact factor of 0,783.

Vacuum focuses its scope in these topics and keywords: steel, hard, ion, behaviour, biased, claserinduced, coating, coatings, concentration, concentrations, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy: Open Choice

Type of publications:

Publication frecuency: -

Price

1980 €

Inmediate OA

NPD

Embargoed OA

0 €

Non OA

Metrics

Vacuum

0,783

SJR Impact factor

108

H Index

950

Total Docs (Last Year)

2474

Total Docs (3 years)

42223

Total Refs

10384

Total Cites (3 years)

2467

Citable Docs (3 years)

4.22

Cites/Doc (2 years)

44.45

Ref/Doc

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Aims and Scope


steel, hard, ion, behaviour, biased, claserinduced, coating, coatings, concentration, concentrations, corrosion, cu, cvd, dc, desorption, diamond, discharges, etching, examinationthe, film, films, hardness, hf, influence, low, magnetron, mass, methane, mf, morphological, n, optical, oxidation, performance, platingelectron, prepared, pressuresputter,



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Dependence of metal sheet resistance on metal etch/post-etch treatment and subsequent process conditions

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The charged dust in processing plasma sheath

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Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets

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Continuous-wave laser thruster experiment

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Bayard-Alpert gauge with additional ion collector for pressure measurements from 10-9-101 mbar

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Investigation of the properties of a condensed rare gas film on a cold metal surface by means of small-angle ion scattering spectroscopy methods

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Treatment of NOx in exhaust gas by corona plasma over water surface

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Effect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates

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Epitaxial growth of CdSeTe films by remote plasma enhanced metal organic chemical vapor deposition

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Deposition of 3C-SiC films using ECR plasma of methylsilane

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Precise determination of the refractive index of sputtered MgO thin films in the visible light range

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Internal-antenna-driven inductive RF discharges for development of large-area high-density plasma sources with suppressed electrostatic coupling

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DC electric-field effect in bulk and thin-film Ge5As38Te57 chalcogenide glass

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The formation of Ti-silicides by a metal vapour vacuum arc ion source implantation and annealing process

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An ultrahigh vacuum chemical vapor deposition system and its application to growth of nMOSFET and HBT structures

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Application of atomic absorption spectrometry to laser plume analysis

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Hydrogen content and outgassing of air-baked and vacuum-fired stainless steel

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The influence of the incidence energy of deposited particles on the growth morphology of thin films

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Large-area production of solar absorbent multilayers by MF-pulsed plasma technology

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