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verified SJR 0,451 · Q2 • database Scopus / SJR & Web of Science indexed
Applied Optics
United States · Optica Publishing Group
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Applied Optics

Applied Optics is a journal indexed in SJR in Atomic and Molecular Physics, and Optics and Electrical and Electronic Engineering with an H index of 224. It has an SJR impact factor of 0,451 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,451.

Applied Optics focuses its scope in these topics and keywords: imaging, characterization, photonic, optical, system, design, integrated, anemometry, antenna, cameras, ...

ISSN: 1559-128X
Editorial: Optica Publishing Group
Category: Atomic and Molecular Physics, and Optics
Indexation: verifiedScopus / SJR verifiedWeb of Science

Unclaimed profile — some fields may be incomplete.

open_in_new Portal NPD menu_book Guidelines NPD
schedule Datos CoP · solo campos en BD
SJR Impact Factor trending_up
0,451 Q2
H-index 224
Tasa de Aceptación pie_chart
19% Selectiva
Fuente Acceptance_Rate
Tiempo a publicación hourglass_top
NPD
Campo Sin dato
Coste de Publicación (APC) payments
NPD Subscription
Ruta Non-OA NPD

Metrics

Campos Scimago / CoP — sin series inventadas

Scopus / SJR Web of Science

SJR Impact

0,451

H-index

224

Docs (year)

1182

Docs 3y

4279

Total refs

36646

Cites 3y

8105

Citable 3y

4264

Cites/Doc 2y

1.83

Ref/Doc

31.0

Immediate OA

—

Embargoed OA

NPD

Non OA / Submission

—

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C-band wavelength tunable mode-locking fiber laser based on CD-SMS structure

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X-ray phase imaging with the unified modulated pattern analysis of near-field speckles at a laboratory source

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Dependence of Brillouin frequency shift on radial and axial strain in silica optical fibers

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Demonstration of vacuum strain effects on a light-collection lens used

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Degeneracy in freeform surfaces described with orthogonal polynomials

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Cryogen adaptive and integrated differential pressure sensor for level sensing based on an optical Fabry-Perot interferometer

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Configuration design for the variable pupil shaping unit of a photolithography machine

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Conception of diffractive wavefront correction for XUV and soft x-ray spectroscopy

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Complex refractive indices measurements of polymers in visible and near-infrared bands

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Complete grid pattern decoding method for a one-shot structured light system

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Compact radial shearing interferometer with a randomly encoded cosinusoidal zone plate for wavefront measurements

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