IEEE Electron Device Letters
IEEE Electron Device Letters is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Electrical and Electronic Engineering with an H index of 179. It has an SJR impact factor of 1,15 and it has a best quartile of Q1. It is published in English. It has an SJR impact factor of 1,15.
IEEE Electron Device Letters focuses its scope in these topics and keywords: silicon, breakdown, schottky, tunnel, transistors, mosfets, film, memory, algangan, thinfilm, ...
Metrics
Scimago and CountryOfPapers database fields
SJR Impact
1,15
H-index
179
Docs (year)
611
Docs 3y
1421
Total refs
14948
Cites 3y
6667
Citable 3y
1412
Cites/Doc 2y
4.53
Ref/Doc
24.46
Immediate OA
—
Embargoed OA
NPD
Non OA / Submission
—
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Best articles by citations
An integrated thermo-capacitive type MOS flow sensor
View moreUV Enhanced Field Emission for beta-Ga2O3 Nanowires
View moreElectronic Switching Effect and Phase-Change Transition in Chalcogenide Materials
View moreElectrical Properties of the Thin-Film Transistor With an Indium-Gallium-Zinc Oxide Channel and an Aluminium Oxide Gate Dielectric Stack Formed by Solution-Based Atmospheric Pressure Deposition
View moreElectrical properties and thermal stability of CVD HfOxNy gate dielectric with poly-Si gate electrode
View moreElectrical characteristics of epitaxially grown SrTiO3 on silicon for metal-insulator-semiconductor gate dielectric applications
View moreEfficiency of SOI-Like Structures for Reducing the Thermal Resistance in Thin-Film SOI Power LDMOSFETs
View moreEffect of ohmic contacts on buffer leakage of GaN transistors
View moreDynamic Analysis of Current-Voltage Characteristics of Nanoscale Gated-Thyristors
View moreCorrecting effective mobility measurements for the presence of significant gate leakage current
View moreComparison of Threshold-Voltage Shifts for Uniaxial and Biaxial Tensile-Stressed n-MOSFETs
View moreCharge-Carrier Velocity Distributions in High-Mobility Polymer Dual-Gate Thin-Film Transistors
View moreAn Intrinsic Delay Extraction Method for Schottky Gate Field Effect Transistors
View more"Corrections to ""An analytical model to project MOS transistor lifetime improvement by deuterium passivation of interface traps"
View moreAn Improved Model of Self-Heating Effects for Ultrathin Body SOI nMOSFETs Based on Phonon Scattering Analysis
View moreA Tunnel Diode Body Contact Structure to Suppress the Floating-Body Effect in Partially Depleted SOI MOSFETs
View moreA Surface-Plasmon-Enhanced Silicon Solar Cell With KOH-Etched Pyramid Structure
View moreA simulation study to evaluate the feasibility of midgap workfunction metal gates in 25 nm bulk CMOS
View moreA Novel Technique to Decouple Electrical and Thermal Effects in SOA Limitation of Power LDMOSFET
View moreA novel germanium doping method for fabrication of high-performance p-channel poly-Si1-xGex TFT by excimer laser crystallization
View moreA New Voltage-Modulated AMOLED Pixel Design Compensating for Threshold Voltage Variation in Poly-Si TFTs
View moreA new self-aligned AlGaAs/GaAs HBT based on refractory emitter and base electrodes
View moreA new combination-erase technique for erasing nitride based (SONOS) nonvolatile memories
View moreA Latchup-Immune and Robust SCR Device for ESD Protection in 0.25-µm 5-V CMOS Process
View more