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verified SJR 1,15 · Q1 • database Scopus / SJR & Web of Science indexed
IEEE Electron Device Letters
United States · Institute of Electrical and...
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IEEE Electron Device Letters

IEEE Electron Device Letters is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Electrical and Electronic Engineering with an H index of 179. It has an SJR impact factor of 1,15 and it has a best quartile of Q1. It is published in English. It has an SJR impact factor of 1,15.

IEEE Electron Device Letters focuses its scope in these topics and keywords: silicon, breakdown, schottky, tunnel, transistors, mosfets, film, memory, algangan, thinfilm, ...

ISSN: 0741-3106
Publisher: Institute of Electrical and Electronics Engineers Inc.
Category: Electronic, Optical and Magnetic Materials
Indexation: verifiedScopus / SJR verifiedWeb of Science
open_in_new Portal NPD menu_book Guidelines NPD
schedule CountryOfPapers database fields
SJR Impact Factor trending_up
1,15 Q1
H-index 179
Acceptance rate pie_chart
21% Selective
Source Acceptance_Rate
Time to publication hourglass_top
NPD
Field NPD
Publication cost (APC) payments
NPD Subscription
Non-OA path NPD

Metrics

Scimago and CountryOfPapers database fields

Scopus / SJR Web of Science

SJR Impact

1,15

H-index

179

Docs (year)

611

Docs 3y

1421

Total refs

14948

Cites 3y

6667

Citable 3y

1412

Cites/Doc 2y

4.53

Ref/Doc

24.46

Immediate OA

—

Embargoed OA

NPD

Non OA / Submission

—

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Effect of ohmic contacts on buffer leakage of GaN transistors

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Comparison of Threshold-Voltage Shifts for Uniaxial and Biaxial Tensile-Stressed n-MOSFETs

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Charge-Carrier Velocity Distributions in High-Mobility Polymer Dual-Gate Thin-Film Transistors

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