ISSN: 0022-3093

Journal Home

Journal Guideline

Journal of Non-Crystalline Solids Q1 Unclaimed

Elsevier Netherlands

Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Journal of Non-Crystalline Solids is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 135. It has an SJR impact factor of 0,712 and it has a best quartile of Q1. It is published in English.

Journal of Non-Crystalline Solids focuses its scope in these topics and keywords: silica, glass, preparation, structural, process, properties, relaxation, studies, effect, method, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Ceramics and Composites (Q1) Materials Chemistry (Q1) Condensed Matter Physics (Q2) Electronic, Optical and Magnetic Materials (Q2)

Price

- €

Gold OA

-

Green OA

- €

Non OA

Metrics

0,712

SJR Impact factor

135

H Index

546

Total Docs (Last Year)

1549

Total Docs (3 years)

24085

Total Refs

4744

Total Cites (3 years)

1538

Citable Docs (3 years)

3,14

Cites/Doc (2 years)

44,11

Ref/Doc

Other journals with similar parameters

Nature Electronics Q1
Nature Electronics Q1
Advanced Functional Materials Q1
Optica Q1
Light: Science and Applications Q1

Aims and Scope

Best articles

`Strong' and `superstrong' liquids, and an approach to the perfect glass state via phase transition

A comment on the Kawabata theory of magnetoresistance in disordered systems

A method of removing metal ions from silicate glasses for recycling by liquid-phase deposition

A study of the PL emission mechanisms in silica glass by considering the growth of the PL

Adiabatic nucleation in supersaturated liquids

Advances in amorphous silicon-based photonic technology

Aluminum-induced crystallization of amorphous silicon

Amine catalyzed condensation of tetraethylorthosilicate

Amorphization and alloy metastability in undercooled systems

Amorphous As-S-Se semiconductor resists for holography and lithography

Amorphous-silicon thin-film transistors deposited by VHF-PECVD and hot-wire CVD

An assessment of isothermal crystallization kinetics in glass by mathematical modeling

SHOW MORE ARTICLES

Atmospheric aging and thermal annealing effects in a-C:H thin films

Bond lattice or excitation model analysis of the configurational entropy of molecular liquids

Carbon nanotubes and a-C films simultaneously fabricated by thermal CVD

Cation site occupation by Ag+/Na+ ion-exchange in R2O-Al2O3-SiO2 glasses

Comparison between the crystallization processes by laser and furnace annealing of pure and doped a-Si:H

Comparison of amorphous Mo and Cr disilicides in hydrogenated amorphous silicon

Composite character of the photoluminescence in hydrogenated amorphous carbon films

Compositional onset of homogeneous nucleation in (Li, Na) disilicate glasses

Compositional variation in the structure of Ge-S glasses

Connection between the microwave and far infrared conductivity of oxide glasses

Contributions to the molecular origin of the dielectric relaxation processes in polysaccharides -the low temperature range

Correlation between the 1.5 eV photoluminescence band and peroxy linkage in silica glass

Comments

No comments ... Be the first to comment!

Publication speed

Review quality

Edition and editorial team

Paper Link

Attach one of your papers. We need to confirm that you have had a relation with this journal in order to review its service.