Default: Journal of Non-Crystalline Solids

ISSN: 0022-3093

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Journal of Non-Crystalline Solids Q1 Unclaimed

Elsevier Netherlands
Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Journal of Non-Crystalline Solids is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 135. It has an SJR impact factor of 0,712 and it has a best quartile of Q1. It is published in English.

Journal of Non-Crystalline Solids focuses its scope in these topics and keywords: silica, glass, preparation, structural, process, properties, relaxation, studies, effect, method, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Metrics

Journal of Non-Crystalline Solids

0,712

SJR Impact factor

135

H Index

546

Total Docs (Last Year)

1549

Total Docs (3 years)

24085

Total Refs

4744

Total Cites (3 years)

1538

Citable Docs (3 years)

3,14

Cites/Doc (2 years)

44,11

Ref/Doc

Aims and Scope


silica, glass, preparation, structural, process, properties, relaxation, studies, effect, method, glasses, surface, aerogels, solgel, ratio, biosilicate, behaviour, aluminoborosilicate, aluminum, amorphoussilicon, applications, asih, atmosphere, bao, based,


Best articles

`Strong' and `superstrong' liquids, and an approach to the perfect glass state via phase transition

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A comment on the Kawabata theory of magnetoresistance in disordered systems

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A method of removing metal ions from silicate glasses for recycling by liquid-phase deposition

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A study of the PL emission mechanisms in silica glass by considering the growth of the PL

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Adiabatic nucleation in supersaturated liquids

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Advances in amorphous silicon-based photonic technology

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Aluminum-induced crystallization of amorphous silicon

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Amine catalyzed condensation of tetraethylorthosilicate

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Amorphization and alloy metastability in undercooled systems

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Amorphous As-S-Se semiconductor resists for holography and lithography

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Amorphous-silicon thin-film transistors deposited by VHF-PECVD and hot-wire CVD

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An assessment of isothermal crystallization kinetics in glass by mathematical modeling

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SHOW MORE ARTICLES

Atmospheric aging and thermal annealing effects in a-C:H thin films

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Bond lattice or excitation model analysis of the configurational entropy of molecular liquids

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Carbon nanotubes and a-C films simultaneously fabricated by thermal CVD

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Cation site occupation by Ag+/Na+ ion-exchange in R2O-Al2O3-SiO2 glasses

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Comparison between the crystallization processes by laser and furnace annealing of pure and doped a-Si:H

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Comparison of amorphous Mo and Cr disilicides in hydrogenated amorphous silicon

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Composite character of the photoluminescence in hydrogenated amorphous carbon films

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Compositional onset of homogeneous nucleation in (Li, Na) disilicate glasses

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Compositional variation in the structure of Ge-S glasses

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Connection between the microwave and far infrared conductivity of oxide glasses

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Contributions to the molecular origin of the dielectric relaxation processes in polysaccharides -the low temperature range

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Correlation between the 1.5 eV photoluminescence band and peroxy linkage in silica glass

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