ISSN: 0272-4324

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Plasma Chemistry and Plasma Processing Q2 Unclaimed

Springer New York United States

Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Plasma Chemistry and Plasma Processing is a journal indexed in SJR in Chemical Engineering (miscellaneous) and Surfaces, Coatings and Films with an H index of 85. It has a price of 2690 €. It has an SJR impact factor of 0,462 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,462.

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy: Open Choice

Type of publications:

Publication frecuency: -

Categories: Chemical Engineering (miscellaneous) (Q2) Chemistry (miscellaneous) (Q2) Condensed Matter Physics (Q2) Surfaces, Coatings and Films (Q2)

Price

2690 €

Inmediate OA

NPD

Embargoed OA

0 €

Non OA

Metrics

0,462

SJR Impact factor

85

H Index

118

Total Docs (Last Year)

268

Total Docs (3 years)

6123

Total Refs

807

Total Cites (3 years)

266

Citable Docs (3 years)

2.91

Cites/Doc (2 years)

51.89

Ref/Doc

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