ISSN: 0272-4324

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Plasma Chemistry and Plasma Processing Q2 Unclaimed

Springer New York United States

Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Plasma Chemistry and Plasma Processing is a journal indexed in SJR in Chemical Engineering (miscellaneous) and Surfaces, Coatings and Films with an H index of 81. It has a price of 2690 €. It has an SJR impact factor of 0,48 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,48.

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy: Open Choice

Type of publications:

Publication frecuency: -

Categories: Chemical Engineering (miscellaneous) (Q2) Chemistry (miscellaneous) (Q2) Condensed Matter Physics (Q2) Surfaces, Coatings and Films (Q2)

Price

2690 €

Inmediate OA

NPD

Embargoed OA

0 €

Non OA

Metrics

0,48

SJR Impact factor

81

H Index

114

Total Docs (Last Year)

259

Total Docs (3 years)

5946

Total Refs

801

Total Cites (3 years)

258

Citable Docs (3 years)

2.81

Cites/Doc (2 years)

52.16

Ref/Doc

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