verified SJR 0,419 · Q2 • database Scopus / SJR & Web of Science indexed

Netherlands · Elsevier B.V.

workspace_premium Q2 — Electronic, Optical and Magnetic Materials lock Subscription Unclaimed

Thin Solid Films

Thin Solid Films is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 218. It has an SJR impact factor of 0,419 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,419.

Thin Solid Films focuses its scope in these topics and keywords: films, thin, deposition, film, optical, coatings, temperature, properties, oxide, si, ...

ISSN: 0040-6090

Editorial: Elsevier B.V.

Category: Electronic, Optical and Magnetic Materials

Indexation: verifiedScopus / SJR verifiedWeb of Science

Unclaimed profile — some fields may be incomplete.

open_in_new Portal NPD menu_book Guidelines NPD

schedule Datos CoP · solo campos en BD

SJR Impact Factor trending_up

0,419 Q2

H-index 218

Tasa de Aceptación pie_chart

20% Selectiva

Fuente Acceptance_Rate

Tiempo a publicación hourglass_top

NPD

Campo Sin dato

Coste de Publicación (APC) payments

NPD Subscription

Ruta Non-OA 0 €

Metrics

Campos Scimago / CoP — sin series inventadas

Scopus / SJR Web of Science

SJR Impact

0,419

H-index

218

Docs (year)

284

Docs 3y

1150

Total refs

12396

Cites 3y

2456

Citable 3y

1145

Cites/Doc 2y

2.12

Ref/Doc

43.65

Immediate OA

—

Embargoed OA

NPD

Non OA / Submission

0 €

shield Researcher voice

Name good journals. Call out predatory ones.

Share what peer review, fees, and timelines were really like. Praise fair editors. Flag APC traps, fake metrics, or spam solicitations — with facts from your submission.

Fair & fast peer review Clear APC / no surprise fees Suspected predatory Fake impact claims

rate_review Write an honest review

Researcher reviews

sentiment_dissatisfied No reviews yet — be the first to share an honest experience.

Publication speed *

Review quality *

Edition and editorial team *

Institutional email or ORCID * * Only to validate authenticity — identity is not shown publicly.

Best articles by citations

Creep studies of the EB PVD coatings with a ceramic layer

Vacuum deposited polymer/metal multilayer films for optical application

Electrical characterization of CVD diamond thin films grown on silicon substrates

Elastic properties of amorphous and nanocrystalline silicon

Effect of r.f.-plasma assistance in hot-wire CVD on properties of ¬µc-Si:H

Effect of nitrogen on diamond growth using unconventional gas mixtures

Effect of hot filament on preparation of YBCO superconducting films by pulsed laser ablation in nitrous oxide gas

EBIC and luminescence mapping of CdTe/CdS solar cells

Doping of rf plasma deposited diamond-like carbon films

Dielectric reference coatings for the evaluation of thin film characterization techniques

Dielectric properties of TiO2 thin films deposited by a DC magnetron sputtering system

Development of Cat-CVD apparatus - a method to control wafer temperatures under thermal influence of heated catalyzer

SHOW MORE ARTICLES

Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments

A Cat-CVD Si3N4 film study and its application to the ULSI process

Correlated structural and electronic properties of microcrystalline silicon films deposited at low temperature by catalytic CVD

Comparison of the properties of BN films synthesized by inductively coupled r.f. and microwave plasmas

Charge-trapping defects in Cat-CVD silicon nitride films

Characterization of lead zirconate titanate heterolayered thin films prepared on Pt/Ti/SiO2/Si substrate by the sol-gel method

Characterization of ion-beam-deposited diamond-like carbon films

Characterization and adhesion study of thin alumina coatings sputtered on PET

Catalytic decomposition of SiH4 on a hot filament

Attempt to synthesize carbon nanotubes by hot-wire chemical vapor deposition

Applicability of ALE TiN films as Cu/Si diffusion barriers

Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

FAQS

In Country of Papers you can find SJR impact factor and other metrics to help you decide on a Journal.