ISSN: 0040-6090

Journal Home

Journal Guideline

Thin Solid Films Q2 Unclaimed

Elsevier Switzerland

Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Thin Solid Films is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 184. It has an SJR impact factor of 0,513 and it has a best quartile of Q2. It is published in English.

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Electronic, Optical and Magnetic Materials (Q2) Materials Chemistry (Q2) Metals and Alloys (Q2) Surfaces and Interfaces (Q2) Surfaces, Coatings and Films (Q2)

Price

- €

Gold OA

-

Green OA

0 €

Non OA

Metrics

0,513

SJR Impact factor

184

H Index

653

Total Docs (Last Year)

2277

Total Docs (3 years)

25457

Total Refs

4596

Total Cites (3 years)

2253

Citable Docs (3 years)

1,99

Cites/Doc (2 years)

38,98

Ref/Doc

Aims and Scope

Other journals with similar parameters

Journal of the Optical Society of America A: Optics and Image Science, and Vision Q2
Journal of Magnetism and Magnetic Materials Q2
Journal of Electronic Packaging, Transactions of the ASME Q2
Journal of Electroceramics Q2
Quantum Information Processing Q2

Best articles

A Cat-CVD Si3N4 film study and its application to the ULSI process

Adhesion of diamond coatings on cemented carbides

Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

Applicability of ALE TiN films as Cu/Si diffusion barriers

Attempt to synthesize carbon nanotubes by hot-wire chemical vapor deposition

Catalytic decomposition of SiH4 on a hot filament

Characterization and adhesion study of thin alumina coatings sputtered on PET

Characterization of ion-beam-deposited diamond-like carbon films

Characterization of lead zirconate titanate heterolayered thin films prepared on Pt/Ti/SiO2/Si substrate by the sol-gel method

Charge-trapping defects in Cat-CVD silicon nitride films

Comparison of the properties of BN films synthesized by inductively coupled r.f. and microwave plasmas

Correlated structural and electronic properties of microcrystalline silicon films deposited at low temperature by catalytic CVD

SHOW MORE ARTICLES

Creep studies of the EB PVD coatings with a ceramic layer

Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments

Development of Cat-CVD apparatus - a method to control wafer temperatures under thermal influence of heated catalyzer

Dielectric properties of TiO2 thin films deposited by a DC magnetron sputtering system

Dielectric reference coatings for the evaluation of thin film characterization techniques

Doping of rf plasma deposited diamond-like carbon films

EBIC and luminescence mapping of CdTe/CdS solar cells

Effect of hot filament on preparation of YBCO superconducting films by pulsed laser ablation in nitrous oxide gas

Effect of nitrogen on diamond growth using unconventional gas mixtures

Effect of r.f.-plasma assistance in hot-wire CVD on properties of ¬µc-Si:H

Elastic properties of amorphous and nanocrystalline silicon

Electrical characterization of CVD diamond thin films grown on silicon substrates

Comments

No comments ... Be the first to comment!

Publication speed

Review quality

Edition and editorial team

Paper Link

Attach one of your papers. We need to confirm that you have had a relation with this journal in order to review its service.