Default: Thin Solid Films

ISSN: 0040-6090

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Thin Solid Films Q2 Unclaimed

Elsevier Switzerland
Unfortunately this journal has not been claimed yet. For this reason, some information may be unavailable.

Thin Solid Films is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 184. It has an SJR impact factor of 0,513 and it has a best quartile of Q2. It is published in English.

Thin Solid Films focuses its scope in these topics and keywords: films, thin, deposition, film, optical, coatings, properties, temperature, situ, oxide, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Metrics

Thin Solid Films

0,513

SJR Impact factor

184

H Index

653

Total Docs (Last Year)

2277

Total Docs (3 years)

25457

Total Refs

4596

Total Cites (3 years)

2253

Citable Docs (3 years)

1,99

Cites/Doc (2 years)

38,98

Ref/Doc

Aims and Scope


films, thin, deposition, film, optical, coatings, properties, temperature, situ, oxide, solar, carbon, magnetron, formation, deposited, si, low, gap, characterization, compound, crystallization, device, energy, fusion,


Best articles

A Cat-CVD Si3N4 film study and its application to the ULSI process

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Adhesion of diamond coatings on cemented carbides

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Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

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Applicability of ALE TiN films as Cu/Si diffusion barriers

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Attempt to synthesize carbon nanotubes by hot-wire chemical vapor deposition

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Catalytic decomposition of SiH4 on a hot filament

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Characterization and adhesion study of thin alumina coatings sputtered on PET

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Characterization of ion-beam-deposited diamond-like carbon films

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Characterization of lead zirconate titanate heterolayered thin films prepared on Pt/Ti/SiO2/Si substrate by the sol-gel method

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Charge-trapping defects in Cat-CVD silicon nitride films

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Comparison of the properties of BN films synthesized by inductively coupled r.f. and microwave plasmas

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Correlated structural and electronic properties of microcrystalline silicon films deposited at low temperature by catalytic CVD

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Creep studies of the EB PVD coatings with a ceramic layer

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Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments

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Development of Cat-CVD apparatus - a method to control wafer temperatures under thermal influence of heated catalyzer

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Dielectric properties of TiO2 thin films deposited by a DC magnetron sputtering system

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Dielectric reference coatings for the evaluation of thin film characterization techniques

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Doping of rf plasma deposited diamond-like carbon films

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EBIC and luminescence mapping of CdTe/CdS solar cells

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Effect of hot filament on preparation of YBCO superconducting films by pulsed laser ablation in nitrous oxide gas

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Effect of nitrogen on diamond growth using unconventional gas mixtures

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Effect of r.f.-plasma assistance in hot-wire CVD on properties of µc-Si:H

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Elastic properties of amorphous and nanocrystalline silicon

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Electrical characterization of CVD diamond thin films grown on silicon substrates

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