ISSN: 0040-6090

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Thin Solid Films Q2 Unclaimed

Elsevier Netherlands

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Thin Solid Films is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 192. It has an SJR impact factor of 0,544 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,544.

Thin Solid Films focuses its scope in these topics and keywords: films, thin, deposition, film, optical, coatings, properties, temperature, situ, oxide, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Electronic, Optical and Magnetic Materials (Q2) Materials Chemistry (Q2) Metals and Alloys (Q2) Surfaces and Interfaces (Q2) Surfaces, Coatings and Films (Q2)

Price

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NPD

Embargoed OA

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Non OA

Metrics

0,544

SJR Impact factor

192

H Index

550

Total Docs (Last Year)

2010

Total Docs (3 years)

21957

Total Refs

4387

Total Cites (3 years)

1998

Citable Docs (3 years)

2,24

Cites/Doc (2 years)

39,92

Ref/Doc

Other journals with similar parameters

Journal of Magnetism and Magnetic Materials Q2
Journal of Solid State Chemistry Q2
IEEE Electrical Insulation Magazine Q2
Journal of Electron Spectroscopy and Related Phenomena Q2
Optics Communications Q2

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Aims and Scope

Best articles by citations

Erratum to: "Field-emission characteristics of chemical vapor deposition-diamond films"

Dielectric properties of TiO2 thin films deposited by a DC magnetron sputtering system

The influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films

High-rate deposition of silicon thin-film solar cells by the hot-wire cell method

Dielectric reference coatings for the evaluation of thin film characterization techniques

Influence of atomic hydrogen on the growth kinetics of a-Si:H films and on the properties of silicon substrates

Characterization and adhesion study of thin alumina coatings sputtered on PET

A Cat-CVD Si3N4 film study and its application to the ULSI process

Quasicrystal films: numerical optimization as a solar selective absorber

Epitaxial growth of gallium nitride by ion-beam-assisted evaporation

Preferred crystallographic orientation relationships of nickel films deposited on (100) cubic-zirconia substrates

Elastic properties of amorphous and nanocrystalline silicon

SHOW MORE ARTICLES

Langmuir and Langmuir-Blodgett films of fluorine-containing side chain liquid crystal copolysiloxanes

Investigation on the origin of wurtzite domains in thick cubic GaN using reactive ion etching

Formation of thin TiNxOy films by using a hollow cathode reactive DC sputtering system

Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD

High-stability hydrogenated amorphous silicon films for light-soaking prepared by catalytic CVD at high deposition rates

Proposal of catalytic chemical sputtering method and its application to prepare large grain size poly-Si

Photo-thermal excitation gas-source MBE growth of super-doped Si:Mn for spin-photonics applications

Influence of cooling rate on the dislocations and related luminescence in LPE SiGe layers grown on Si (100) substrates

Guiding principles for device-grade hydrogenated amorphous silicon films and design of catalytic chemical vapor deposition apparatus

Electrical characterization of CVD diamond thin films grown on silicon substrates

Effect of r.f.-plasma assistance in hot-wire CVD on properties of ¬µc-Si:H

Precursor gas effect on the mechanical and optical properties of ion beam deposited diamond-like carbon films

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