ISSN: 0040-6090
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Thin Solid Films Q2 Unclaimed
Thin Solid Films is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 206. It has an SJR impact factor of 0,454 and it has a best quartile of Q2. It is published in English. It has an SJR impact factor of 0,454.
Thin Solid Films focuses its scope in these topics and keywords: films, thin, deposition, film, optical, coatings, deposited, formation, low, solar, ...
Type: Journal
Type of Copyright:
Languages: English
Open Access Policy:
Type of publications:
Publication frecuency: -


- €
Inmediate OANPD
Embargoed OA0 €
Non OAMetrics
0,454
SJR Impact factor206
H Index402
Total Docs (Last Year)1579
Total Docs (3 years)16323
Total Refs3515
Total Cites (3 years)1570
Citable Docs (3 years)2.18
Cites/Doc (2 years)40.6
Ref/DocOther journals with similar parameters
IEEE Photonics Technology Letters Q2
IEEE Transactions on Electron Devices Q2
Photonic Sensors Q2
Optics and Photonics News Q2
EPJ Photovoltaics Q2
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Aims and Scope
Best articles by citations
Erratum to: "Field-emission characteristics of chemical vapor deposition-diamond films"
View moreDielectric properties of TiO2 thin films deposited by a DC magnetron sputtering system
View moreThe influence of different catalyzers in hot-wire CVD for the deposition of polycrystalline silicon thin films
View moreHigh-rate deposition of silicon thin-film solar cells by the hot-wire cell method
View moreDielectric reference coatings for the evaluation of thin film characterization techniques
View moreInfluence of atomic hydrogen on the growth kinetics of a-Si:H films and on the properties of silicon substrates
View moreCharacterization and adhesion study of thin alumina coatings sputtered on PET
View moreA Cat-CVD Si3N4 film study and its application to the ULSI process
View moreQuasicrystal films: numerical optimization as a solar selective absorber
View moreEpitaxial growth of gallium nitride by ion-beam-assisted evaporation
View morePreferred crystallographic orientation relationships of nickel films deposited on (100) cubic-zirconia substrates
View moreElastic properties of amorphous and nanocrystalline silicon
View moreLangmuir and Langmuir-Blodgett films of fluorine-containing side chain liquid crystal copolysiloxanes
View moreInvestigation on the origin of wurtzite domains in thick cubic GaN using reactive ion etching
View moreFormation of thin TiNxOy films by using a hollow cathode reactive DC sputtering system
View moreInfluence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD
View moreHigh-stability hydrogenated amorphous silicon films for light-soaking prepared by catalytic CVD at high deposition rates
View moreProposal of catalytic chemical sputtering method and its application to prepare large grain size poly-Si
View morePhoto-thermal excitation gas-source MBE growth of super-doped Si:Mn for spin-photonics applications
View moreInfluence of cooling rate on the dislocations and related luminescence in LPE SiGe layers grown on Si (100) substrates
View moreGuiding principles for device-grade hydrogenated amorphous silicon films and design of catalytic chemical vapor deposition apparatus
View moreElectrical characterization of CVD diamond thin films grown on silicon substrates
View moreEffect of r.f.-plasma assistance in hot-wire CVD on properties of µc-Si:H
View morePrecursor gas effect on the mechanical and optical properties of ion beam deposited diamond-like carbon films
View more
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