Default: Thin Solid Films

ISSN: 0040-6090

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Thin Solid Films Q2 Unclaimed

Elsevier Switzerland
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Thin Solid Films is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Materials Chemistry with an H index of 184. It has an SJR impact factor of 0,513 and it has a best quartile of Q2. It is published in English.

Thin Solid Films focuses its scope in these topics and keywords: films, thin, deposition, film, optical, coatings, properties, temperature, situ, oxide, ...

Type: Journal

Type of Copyright:

Languages: English

Open Access Policy:

Type of publications:

Publication frecuency: -


Thin Solid Films


SJR Impact factor


H Index


Total Docs (Last Year)


Total Docs (3 years)


Total Refs


Total Cites (3 years)


Citable Docs (3 years)


Cites/Doc (2 years)



Aims and Scope

films, thin, deposition, film, optical, coatings, properties, temperature, situ, oxide, solar, carbon, magnetron, formation, deposited, si, low, gap, characterization, compound, crystallization, device, energy, fusion,

Best articles

A Cat-CVD Si3N4 film study and its application to the ULSI process

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Adhesion of diamond coatings on cemented carbides

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Amorphous and microcrystalline silicon deposited by hot-wire chemical vapor deposition at low substrate temperatures: application to devices and thin-film microelectromechanical systems

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Applicability of ALE TiN films as Cu/Si diffusion barriers

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Attempt to synthesize carbon nanotubes by hot-wire chemical vapor deposition

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Catalytic decomposition of SiH4 on a hot filament

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Characterization and adhesion study of thin alumina coatings sputtered on PET

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Characterization of ion-beam-deposited diamond-like carbon films

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Characterization of lead zirconate titanate heterolayered thin films prepared on Pt/Ti/SiO2/Si substrate by the sol-gel method

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Charge-trapping defects in Cat-CVD silicon nitride films

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Comparison of the properties of BN films synthesized by inductively coupled r.f. and microwave plasmas

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Correlated structural and electronic properties of microcrystalline silicon films deposited at low temperature by catalytic CVD

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Creep studies of the EB PVD coatings with a ceramic layer

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Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments

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Development of Cat-CVD apparatus - a method to control wafer temperatures under thermal influence of heated catalyzer

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Dielectric properties of TiO2 thin films deposited by a DC magnetron sputtering system

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Dielectric reference coatings for the evaluation of thin film characterization techniques

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Doping of rf plasma deposited diamond-like carbon films

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EBIC and luminescence mapping of CdTe/CdS solar cells

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Effect of hot filament on preparation of YBCO superconducting films by pulsed laser ablation in nitrous oxide gas

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Effect of nitrogen on diamond growth using unconventional gas mixtures

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Effect of r.f.-plasma assistance in hot-wire CVD on properties of µc-Si:H

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Elastic properties of amorphous and nanocrystalline silicon

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Electrical characterization of CVD diamond thin films grown on silicon substrates

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