verified COP 2,4 · Q2 • database Scopus / SJR & Web of Science indexed

Netherlands · Elsevier B.V.

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Ultramicroscopy

Ultramicroscopy is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics with an H index of 142. It has a price of 2745 €. It has a COP Index of 2,4 (best band Q2). It is published in English. It has a COP Index of 2,4.

Ultramicroscopy focuses its scope in these topics and keywords: electron, image, microscope, resolution, orientation, phase, determination, force, stem, multivariate, ...

ISSN: 0304-3991

Publisher: Elsevier B.V.

Category: Electronic, Optical and Magnetic Materials

Indexation: verifiedScopus / SJR verifiedWeb of Science

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schedule CountryOfPapers database fields

COP Index trending_up

2,4 Q2

54 of 129 journals in Instrumentation

H-index · SJR 142 · 0,716

Acceptance rate pie_chart

23% Selective

Source Acceptance_Rate

Time to publication hourglass_top

NPD

Field NPD

Publication cost (APC) payments

2.745 € Subscription

Non-OA path 0 €

Metrics

Scimago and CountryOfPapers database fields

Scopus / SJR Web of Science

COP Index

2,4

SJR Impact

0,716

H-index

142

Docs (year)

121

Docs 3y

384

Total refs

4616

Cites 3y

849

Citable 3y

382

Cites/Doc 2y

2.32

Ref/Doc

38.15

Immediate OA

2745 €

Embargoed OA

NPD

Non OA / Submission

0 €

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Best articles by citations

Atomic structure of InxGa1-xAs/GaAs(001) (2?o4) and (3?o2) surfaces

Zero-loss image formation and modified contrast transfer theory in EFTEM

Differential phase contrast in TEM

Development of near-field optic/atomic-force microscope for biological materials in aqueous solutions

Determination of interfacial residual stress field in an Al-Al2O3 composite using convergent-beam electron diffraction technique

Cross-sectional atomic force microscopy imaging of polycrystalline thin films

Correction of three-fold astigmatism for ultra-high-resolution TEM

Contrast mechanisms and imaging modes in near field optical microscopy

Computer simulation and object reconstruction in low-energy off-axis electron holography

Comparative REM and AFM investigations of the surface recovery of MBE-grown GaAs(001)-layers during annealing

Chemical force microscopy of microcontact-printed self-assembled monolayers by pulsed-force-mode atomic force microscopy

CART: a controlled algebraic reconstruction technique for electron microscope tomography of embedded, sectioned specimen

SHOW MORE ARTICLES

Automatic particle picking from electron micrographs

A fuzzy logic approach to image analysis of HREM micrographs of III-V compounds

Atomic ratios determined by EELS under parallel and convergent illumination conditions

Asymmetries in electron Compton profiles of silicon - a coherence effect

Analysis of local strain in aluminium interconnects by energy filtered CBED

An imaging filter for biological applications

Alignment of AFM images using an iterative mathematical procedure

Advanced spatially resolved EELS in the STEM

Acceptance of imaging energy filters

Ab initio study on interaction between carbon atom and Si(100) surface in strong electric fields

A spectral estimation approach to contrast transfer function detection in electron microscopy

A pattern recognition technique for the analysis of grain boundary structure by HREM

FAQs

Ultramicroscopy has a COP Index of 2,4 (Q2), ranked 54 of 129 in Instrumentation. SJR: 0,716.

Immediate OA APC is 2745 EUR. Non-OA / submission fee is 0 EUR.

The acceptance rate recorded for Ultramicroscopy is 23%.

Ultramicroscopy

Metrics

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Researcher reviews

Best articles by citations

FAQs

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