verified SJR 0,393 · Q2

United States · SPIE

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Journal of Micro/ Nanolithography, MEMS, and MOEMS

Journal of Micro/ Nanolithography, MEMS, and MOEMS is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics with an H index of 45. It has a price of 2395 €. It has an SJR impact factor of 0,393 and it has a best quartile of Q2. It has an SJR impact factor of 0,393.

ISSN: 1932-5150

Publisher: SPIE

Category: Electronic, Optical and Magnetic Materials

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schedule CountryOfPapers database fields

SJR Impact Factor trending_up

0,393 Q2

H-index 45

Acceptance rate pie_chart

32%

Source Acceptance_Rate

Time to publication hourglass_top

NPD

Field NPD

Publication cost (APC) payments

2.395 € Subscription

Non-OA path 0 €

Metrics

Scimago and CountryOfPapers database fields

SJR Impact

0,393

H-index

Docs (year)

Docs 3y

166

Total refs

1617

Cites 3y

309

Citable 3y

142

Cites/Doc 2y

1.78

Ref/Doc

24.88

Immediate OA

2395 €

Embargoed OA

NPD

Non OA / Submission

0 €

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Best articles by citations

Cost of Scaling

Wide and continuous wavelength tuning of microcavity devices for optoelectronic applications

Efficient magnetic microactuator with an enclosed magnetic core

Effective exposure-dose monitor technique for critical dimension control in optical lithography

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering

Diffraction analysis of digital micromirror device in maskless photolithography system

Desirable reticle flatness from focus deviation standpoint in optical lithography

Design, fabrication, and characterization of a full complex-amplitude modulation diffractive optical element

Design and fabrication of Fabry-Perot filters for infrared hyperspectral imagers

Design and characterization of two-axis rotational micromirrors using multi-user microelectromechanical system processes

Depth of focus in multilayered media - a long-neglected phenomenon aroused by immersion lithography

SHOW MORE ARTICLES

Customized illumination aperture filter design for through-pitch focus latitude enhancement of deep submicron contact hole printing

157 nm lithography with high numerical aperture lens for the 70 nm technology node

Contrast analysis and optimization for resolution enhancement technique

Continuous-tone grayscale mask fabrication using high-energy-beam-sensitive glass

Complex two-dimensional pattern lithography using chromeless phase lithography

Compact electron-based extreme ultraviolet source at 13.5 nm

Co-optimization of the mask, process, and lithography-tool parameters to extend the process window

Characterization of residual strain in SiC films deposited using 1,3-disilabutane for MEMS application

Characterization and analysis of photonic crystal coupled waveguides

Centrifugation and spin-coating method for fabrication of three-dimensional opal and inverse-opal structures as photonic crystal devices

Candidate plasma-facing materials for extreme ultraviolet lithography source components

Bulk micromachining of a MEMS tunable Fabry-Perot interferometer: effect of residual silicon on device performance

FAQs

Journal of Micro/ Nanolithography, MEMS, and MOEMS has an SJR of 0,393 (best quartile Q2) in the CountryOfPapers database.

Immediate OA APC is 2395 EUR. Non-OA / submission fee is 0 EUR.

The acceptance rate recorded for Journal of Micro/ Nanolithography, MEMS, and MOEMS is 32%.

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Metrics

Name good journals. Call out predatory ones.

Researcher reviews

Best articles by citations

FAQs

What is the SJR of Journal of Micro/ Nanolithography, MEMS, and MOEMS?

What is the APC / publication cost?

What is the acceptance rate?