ISSN: 1932-5150

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Journal of Micro/ Nanolithography, MEMS, and MOEMS Q2 Unclaimed

SPIE United States

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Journal of Micro/ Nanolithography, MEMS, and MOEMS is a journal indexed in SJR in Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics with an H index of 45. It has a price of 2395 €. It has an SJR impact factor of 0,393 and it has a best quartile of Q2. It has an SJR impact factor of 0,393.

Type: Journal

Type of Copyright:

Languages:

Open Access Policy:

Type of publications:

Publication frecuency: -

Categories: Mechanical Engineering (Q2) Atomic and Molecular Physics, and Optics (Q3) Condensed Matter Physics (Q3) Electrical and Electronic Engineering (Q3) Electronic, Optical and Magnetic Materials (Q3) Nanoscience and Nanotechnology (Q3)

Price

2395 €

Inmediate OA

NPD

Embargoed OA

0 €

Non OA

Metrics

Journal of Micro/ Nanolithography, MEMS, and MOEMS

0,393

SJR Impact factor

45

H Index

65

Total Docs (Last Year)

166

Total Docs (3 years)

1617

Total Refs

309

Total Cites (3 years)

142

Citable Docs (3 years)

1.78

Cites/Doc (2 years)

24.88

Ref/Doc

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Aims and Scope

Best articles by citations

Standard cell design with resolution-enhancement-technique-driven regularly placed contacts and gates

High-radiance extreme-ultraviolet light source for actinic inspection and metrology

Complex two-dimensional pattern lithography using chromeless phase lithography

Continuous-tone grayscale mask fabrication using high-energy-beam-sensitive glass

Simulation of the 45-nm half-pitch node with 193-nm immersion lithography - imaging interferometric lithography and dipole illumination

Numerical method to predict and fabricate aspherical microlens arrays using 248-nm excimer laser ablation

Novel multi-user-MEMS-processes-compatible single-layer out-of-plane electrothermal actuator

Desirable reticle flatness from focus deviation standpoint in optical lithography

Characterization and analysis of photonic crystal coupled waveguides

Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering

Fabrication of microsuspensions on silicon substrate

Intensity imbalance in phase shift masks and correction by multiple exposures

SHOW MORE ARTICLES

High resolution templates for step and flash imprint lithography

Understanding chromatic aberration impacts on lithographic imaging

Guest Editorial: A Transition for JM3

Contrast analysis and optimization for resolution enhancement technique

Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applications

Compact electron-based extreme ultraviolet source at 13.5 nm

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Candidate plasma-facing materials for extreme ultraviolet lithography source components

Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm

Micro-Optics for Photonic Networks

Efficient magnetic microactuator with an enclosed magnetic core

Electron beam mastering process realized over a 100-GB/layer capacity disk